|
Product Name |
Brand |
Main Role |
Application Area |
Performance Introduction |
|
Dynamic wetting agent |
MFD W111 |
Dynamic wetting leveling |
Photovoltaic wafer cutting |
◇Improve the yield of silicon wafers, reduce line marks, TTV and dirty chips ◇High-efficiency wire cutting processing, reducing powder stacking ◇Improve the cooling performance of cutting fluid |
|
Super wetting agent |
MFD HW1000 |
Dynamic wetting leveling |
Photovoltaic wafer cutting |
◇Low foam, low surface tension, excellent dynamic wettability ◇Good compatibility, easy to mix ◇Low addition |
|
Trans-block polyether |
MFD W2000 |
Lubrication dispersion |
Photovoltaic wafer cutting
|
◇Polyether with special structure has better lubricity and is especially suitable for cutting large size silicon wafers ◇The dispersion effect of silicon powder is better and the yield is greatly improved ◇Good compatibility, easier to mix |
|
Wetting leveling |
MFD W330 |
Dynamic wetting leveling |
Lithium battery diaphragm |
◇Excellent wettability, suitable for water-based high-speed coating ◇Rapid leveling can effectively solve the problems of coating defects and uneven thickness ◇Low foam to avoid fish eye problems caused by foam |
|
High-purity graphene negative segregation material |
MFD W560 |
Dynamic wetting leveling |
Waterborne paint |
◇Excellent dynamic wetting performance, greatly reducing system surface tension ◇Good wetting and dispersing effect on pigments and fillers ◇low-foaming |